柔性ITO衬底电化学沉积制备Cu/Cu_2O薄膜  

Preparation of Cu/Cu_2O Thin Films on Flexible ITO Substrates via Electrochemical Deposition

作　　者：董林[1] 马莹[1] 李豪[1] 贾晓林[1] 

机构地区：[1]郑州大学 材料科学与工程学院,河南郑州450001

出　　处：《发光学报》2007年第5期798-801,共4页Chinese Journal of Luminescence

摘　　要：研究了使用电化学沉积法于碱性条件下在柔性ITO衬底上制备Cu/Cu_2O薄膜的方法。循环伏安曲线表明Cu_2O与Cu的阴极峰分别位于-500 mV(vs Ag/AgCl)和-800 mV(vs Ag/AgCl)附近。利用循环伏安法考察了生长温度和电解液pH值等对Cu_2O与Cu阴极峰电位的影响,阴极峰随生长温度的升高以及pH值的降低而略向阳极移动,沉积电流也随之相应增大。与弱酸性条件相比,上述两个阴极峰随pH值升高而移动的程度明显减小,这可能与碱性条件下C_3H_6O电离程度增大以及C_3H_6O根作为配体的过量程度有关。通过X射线衍射光谱和扫描电子显微镜的表征证实,在所研究的生长温度区间和pH值内可利用电化学沉积法在柔性ITO衬底上制备Cu/Cu_2O纳米混晶薄膜。在相同的生长温度和pH条件下,电化学沉积电位对样品表面形貌和晶体性质具有较大影响。This paper focused on the preparation of cuprous oxide thin films on flexible ITO substrates via electrochemical deposition in alkaline aqueous solution of sodium lactate and cupric sulphate. The voltammetric curves indicates two well-defined cathodic peaks at about -500 and about -800 mV （vs Ag/AgCl） due to the presence of cupric ions in the electrolyte, which were attributed to the formation of Cu and Cu2O on the substrate, respectively. The dependency of the cathodic potential on the growth temperature and the pH value of the electrolyte were investigated according to the cycle volt-ampere method. Lowering of the cathodic deposition potentials and increase in the deposition current are evident with the increase in temperature for both cathodic peaks. Both cathodic peaks were also shifted anemically with the decrease in pH value, accompanied with the increase in deposition current. As compared with that obtained in weak acidic aqueous solution, the tendency of anodic shift of these two cathodic peaks according to the decrease in pH value decreased obviously, which may stems from the fully ionization of lactate acid under alkaline circumstances and the excessive lactate acid as the ligand for both Cu （ I ） and Cu （ 11 ）. The surface morphology and crystalline features of the deposited thin films were obtained by using the scanning electron microscope and X-ray diffraction methods, respectively. It was observed that the electro-deposition of Cu/Cu2O nanocrystalline thin films on the flexible substrate is feasible in the deposition temperature and pH value range investigated in this work. And the surface morphology and crystalline features of the resultant deposits depends heavily on the cathodic potentials when the deposition temperature and pH value are the same.

关 键 词：CU2O 电化学沉积 柔性衬底 

分 类 号：O484.1[理学—固体物理]