射频磁控溅射钛镀层与陶瓷界面的X射线光电子能谱研究  

XPS STUDY ON THE INTERFACIAL STRUCTURE OF RF MAGNETRON SPUTTERED TITANIUM COATINGS AND CERAMICS

作　　者：张汉林[1,2] 刘韩星[1,2] 王典芬 欧阳世翕[1,2] 袁润章 任海兰[1,2] 

机构地区：[1]武汉工业大学材料复合新技术国家重点实验室 [2]中国科学院武汉物理所

出　　处：《复合材料学报》1997年第2期40-44,共5页Acta Materiae Compositae Sinica

基　　金：国家自然科学基金

摘　　要：本文采用ＸＰＳ配合Ａｒ＋离子原位刻蚀研究了用射频磁控溅射法制备Ｔｉ／Ａｌ２Ｏ３（０００１），Ｔｉ／Ａｌ２Ｏ３（多晶）和Ｔｉ／ＭｇＯ（００１）体系的界面结构。结果表明，在Ｔｉ／Ａｌ２Ｏ３体系的界面处存在Ａｌ３＋的还原态和Ｔｉ的氧化态，且在刻蚀过程中，Ａｌ３＋的还原态出现在Ｔｉ的氧化态之前。用相同方法制备的Ｔｉ／ＭｇＯ界面没有产生类似的界面反应。The interfacial structure of Ti/single crystal Al 2O 3(0001), Ti/polycrystalline Al 2O 3, and Ti/single crystal MgO(001)system made by RF magnetron sputtering was investigated by using XPS combining with Ar + ion in situ etching in this paper. The results show that the reduction of Al 3+ and oxidation of titanium exist at the interface of Ti/Al 2O 3 systems. Moreover, the reduced Al appears before the oxided Ti at the interface of Ti/Al 2O 3 in the etching process. No similar interfacial reaction was observed at the interface of Ti/MgO system by the same making method.

关 键 词：钛镀层 XPS 陶瓷 界面结构 薄膜 

分 类 号：O484.1[理学—固体物理]