多弧离子法制备的Ti(C,N)微结构随C_2H_2/N_2流量比变化的研究(英文)  

STUDY OF THE MICROSTRUCTURE OF TI(C,N) FILM PREPARED BY MULTI-ARC ION-PLATING

作　　者：杨礼富[1] 辛煜[1] 范叔平[1] 金宗明[2] 

机构地区：[1]苏州大学薄膜材料实验室,215006 [2]苏州大学分析与测试中心,215006

出　　处：《苏州大学学报（自然科学版）》1997年第2期81-85,共5页Journal of Soochow University(Natural Science Edition)

摘　　要：用多弧离子法在高速钢(W18Cr4V)基底上沉积了Ti(N,C)薄膜,并运用SEM、XRD、XPS对该膜微观结构随进气流量比r=C_2H_2/N_2变化的情况进行了测试和分析。结果表明薄膜随r增加趋于致密,在r值较小时呈现较强的(111)择优取向,随着r值增大,(111)这一取向逐渐变弱,(220)取向渐强,薄膜呈现典型面心立方结构,主要成分为复合相Ti(N,C),膜含有少量石墨相成分存在。The Ti (C, N) multi-component coatings are deposited on the HSS steel (W18Cr4V) substrates by muti - arc ion - plating with variationg of reactive gas flow ratio r=C2H2/N2, and the coatings are tested and analysed by XPS, XRD , SEM techniques , The results show that the Ti ( C, N ) coating exhibits a very-strong (111) preferred orientation when the value of r is very low. The (111) peak decreases and (220) peak increases with the increasing of r while the coating becomes more dense . The film shows typical face - centered cubic structure . The component of the film is Ti ( C, N), but there is little graphite component in the coating.

关 键 词：多弧离子法 择优取向 SEM 薄膜 微观结构 钛 

分 类 号：O484.1[理学—固体物理]