CVD参数数据采集系统  

Data Acquisition System for Chemical Vapor Deposition Parameters

作　　者：褚向前[1] 朱武[1] 

机构地区：[1]合肥工业大学机械与汽车工程学院,安徽合肥230009

出　　处：《自动化技术与应用》2007年第10期119-120,96,共3页Techniques of Automation and Applications

摘　　要：在CVD金刚石膜生长过程中,衬底温度、热丝电流、反应室真空度和气源流量等是其重要的工艺参数。针对CVD金刚石膜沉积生长中四个重要的工艺参数,本文设计了数据采集系统。选用片内集成模拟量采集模块的8098单片机为下位机,上位机采用工控机,通过RS232串口进行通信。该主从式数据采集系统,硬件配置简单,抗干扰能力强,软件编程方便,人机界面友好。该系统己通过调试,运行良好。The substrate temperature, hot-filament electrical current, vapor pressure in the room and reaction gas fluxc are key parameters in the process of CVD diamond film growth. In order to acquire the key parameters that affect the preparation of CVD diamond films, a data acquisition system based on the upper and lower computer is designed. RS232 is used as the serial communication interface. The system has the advantages of simple hardware configure, interference-free, convenient software orogramming and friendlv man-machine interference.

关 键 词：8098单片机 数据采集系统 串行通讯 

分 类 号：TP274[自动化与计算机技术—检测技术与自动化装置]