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机构地区:[1]贵金属研究所
出 处:《贵金属》1997年第2期8-13,共6页Precious Metals
基 金:云南省科委青年科学基金
摘 要:RuO2基厚膜电阻器的电阻温度系数TCR取决于RuO2的含量,存在RuO2含量的临界点(Wc),该临界点的TCR近似为零。当RuO2含量低于Wc时,电阻有负温度系数,系数值随RuO2含量的减少单调增大。当RuO2含量高于Wc时,电阻有正温度系数,其系数值随RuO2含量的增加单调增大。用Pike和Seager提出的隧道效应模型计算电阻器的热电阻温度系数(HTCR)和冷电阻温度系数(CTCR),计算结果与临界点Wc的实验数据相符合。对低于或高于Wc的情况,应考虑RuO2含量的影响因素。由修正后的隧道效应模型计算的HTCR和CTCR更接近实验数据。作者认为:RuO2含量高的电阻器主要是金属型传导模型,而RuO2含量低的电阻器以隧道效应模型为主。The temperature dependence of resistance of RuO 2-based thick film resistors were investigated. The temperature coefficient of resistance( TCR) of resistors depends on RuO 2 content. There is a critical point of RuO 2 content, Wc, at this point the TCR measured is approximately equal to zero. As the RuO 2 content is less than Wc, the resistors get negative TCR which is increased with the decrease of RuO 2 content. As the RuO 2 content is more than Wc, the positive TCR is gotten which is increased with the increase of RuO 2 content. The tunneling model was used to calculate the hot and cold temperature coefficients of resistance (HTCR and CTCR). The calculated results are corresponding to the experimental data at Wc. For those beyond Wc, a modified tunneling model was proposed. By using this modified model we conclude that a resistor having a high RuO 2 content has a metal-like conduction, however, the resistor having a low RuO 2 content has a tunneling conduction.
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