动态湿润过程中薄液膜厚度场的演化  

Evolution of ultra-thin liquid film in dynamic wetting

作　　者：王晓东[1] 彭晓峰[2] 张欣欣[1] 

机构地区：[1]北京科技大学机械工程学院热能工程系,北京100083 [2]清华大学热能工程系,北京100084

出　　处：《航空动力学报》2007年第11期1808-1813,共6页Journal of Aerospace Power

基　　金：国家自然科学基金资助项目(No.50406001)

摘　　要：采用润滑近似分析完全浸润流体低毛细数下的动态湿润过程.结果表明,van der Waals长程相互作用力对表观接触线附近的液膜厚度场有重要影响,对于排斥的van der Waals力,膨胀压力大于零,自由界面上气相压力高于液相压力,液膜厚度随van der Waals力的增大而增大.毛细数对液膜厚度的影响表现为毛细数越大,液膜越厚.Lubrication approximation was used to analyze the evolution of ultra-thin liquid film in the dynamic wetting of complete wetting fluid at low capillary number. The re-sults indicate that van der Waals forces have an important effect on the interracial profile of the ultra-thin liquid film in the vicinity of the apparent contact line. For repulsive van der Waals forces, the disjoining pressure is larger than zero, and the vapor pressure outside the interface is higher than the pressure of the liquid film. The thickness profile of the ultra-thin liquid film increases with the increase of van der Waals forces. Furthermore, the capillary number also affects the thickness profile of the film in that higher capillary number leads to thicker liquid film.

关 键 词：动态湿润 VAN der Walls力 薄液膜 

分 类 号：TK124[动力工程及工程热物理—工程热物理]