氧化镍及氧化钨薄膜电致变色机制的研究  

A Study of the Electrochromics Mechanism of NiO_x and WO_x Films

作　　者：王晓光[1] 江月山[1] 杨乃恒[1] 袁磊 王毓民[3] 

机构地区：[1]东北大学真空工程系,沈阳110006 [2]中科院北京真空物理开放实验室,北京100080 [3]沈阳真空技术研究所,沈阳110042

出　　处：《真空科学与技术》1997年第4期226-232,共7页Vacuum Science and Technology

摘　　要：通过ZrO_2膜层与NiOx，WOx膜层的不同组合，在液态电解质下，测得不同电致变色膜系的电化学特性及相应着、脱色状态的光透射性能。证明了ZrO2膜层具有导通离子而隔断电子的离子导体层特性，并对NiOx膜层的变色机制进行了探讨。用X射线衍射方法对不同状态下NiOx，WOx薄膜的物相分析表明：电致变色反应中的阳离子注入膜层，使薄膜向有序化排列变化，共产生晶格类型的转变。Different electrochromic (EC) multilayered systems of ZrO2,NiOx and WOx were prepared by DC magnetron sputtering. Their electrochemical properties and their luminous transmittance were studied. Our results showed that monoclinic structured ZrO2 films can be characterized as an ionic conducting layer. The mechanism of electrochromic NiOx film was also discussed. The structures and composition of NiOx and WOx under different conditions were studied by XRD technique. The measurement showed that the injection of cations into the films resulted in considerable structural changes of the thin films,including the crystal type transition and a certain disorder-to-order transition.

关 键 词：电致变色 离子导电层 晶格晶胞 氧化镍 薄膜 

分 类 号：O484.41[理学—固体物理]