溅射气压对TbFeCo磁光薄膜的光学常数的影响  

Effects of sputtering Ar pressure on the optical constants of TbFeCo/Si

作　　者：张勇[1] 张晋敏[1] 余平[1] 田华[1] 

机构地区：[1]贵州大学电子科学与信息技术学院,贵州贵阳550025

出　　处：《功能材料》2007年第A03期1074-1076,共3页Journal of Functional Materials

基　　金：贵州省教育厅大学生创业基金资助项目（701059101）;贵州省科技厅自然科学基金资助项目（20033059）;贵州省教育厅自然科学基金资助项目（2003315）.

摘　　要：利用直流磁控溅射制备了TbFeCo/Si薄膜，采用可变入射角全自动椭圆偏振光谱仪，测量了用磁控溅射法制备的TbFeCo/Si薄膜的光学常数，测量能量范围为1．5～4．5eV。分析了不同氩气压强对磁控溅射制备的TbFeCo/Si磁光薄膜的光学常数的影响。实验结果表明，在低能区域，样品的所有光学常数均随压强增加而增加，受制备工艺影响较大。但在高能区域，光学常数随压强的变化相对说来不再明显．We prepared TbFeCo/Si （100） magneto-optical films by DC-magnetron sputtering. The optical constants of TbFeCo/Si have been measured by spectroscopic ellipsometry, the measured photo energy range is from 1.5 to 4.5eV. The effects of sputtering Ar pressure on optical constants of TbFeCo/Si have been analyzed. The results show that the optical constants of TbFeCo/Si increase with Ar pressure increasing within lower energy range, the parameter of sputtering is a key for improving the quality of films fabricated by magnetron sputtering, but the effects of Ar pressure are no more obvious in higher energy range.

关 键 词：磁控溅射 TbFeCo薄膜 椭偏光谱 光学常数 

分 类 号：O484.1[理学—固体物理]