TbFe磁性薄膜的磁力显微镜成像研究  

Study on magnetic imaging of TbFe thin film by MFM

作　　者：王志红[1] 周宇[1] 沈博侃[1] 陈琨[1] 

机构地区：[1]电子科技大学 电子薄膜与集成器件国家重点实验室,四川成都610054

出　　处：《功能材料》2007年第A03期1266-1267,共2页Journal of Functional Materials

基　　金：国家重点基础研究发展计划（973计划）资助项目（51310Z）.

摘　　要：利用磁力显微镜（MFM）对TbFe磁性薄膜进行了不同抬举距离（分别为60～780nm）的磁力成像研究．在实验中，比较了低抬举距离（100nm以下）磁力像中样品-针尖的互相干扰；同时发现在高抬举距离磁力像中，随着抬举距离的增大，出现了与高凸起形貌对应的图像衬度特征，并随抬举距离的变化也改变着位置与强度，一直到抬举距离为仪器的极限值780nm时，形貌干扰仍未消失，对其形成机制进行了分析．This paper has introduced the magnetic force imaging on TbFe magnetic thin film of long range variation of lift distance （60～780nm）. In the experiment, the sample-tip disturbance under 100nm in the magnetic force images was analyzed. And it was found that, some dark figures conforming to the topographical image appeared when the lift distance was larger. Moreover, there were bright contours, which were changing their position and strength as the lift distance increased on the edges of the dark figures.

关 键 词：TbFe薄膜 磁力显微镜 抬举距离 

分 类 号：TH742[机械工程—光学工程] TN16[机械工程—仪器科学与技术]