光学浮区法生长技术及其在晶体生长中的应用  

Optical floating zone furnace： principles and applications in crystal growth

作　　者：武安华[1] 申慧[1] 徐家跃[1] 小川贵代[2] 和田智之[2] 

机构地区：[1]中国科学院上海硅酸盐研究所,上海200050 [2]日本理化学研究所,和光351-0198

出　　处：《功能材料》2007年第A10期4036-4039,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目（50672110）;国家高技术研究发展计划（863计划）资助项目（2006AA0320419） 致谢：感谢中国科学院和日本理化学研究所科技合作项目的资助.

摘　　要：光学浮区法是近些年来倍受关注的晶体生长的新方法，具有无需坩埚、无污染、生长速度快等优点，十分适合于晶体生长研究。介绍了光学浮区法晶体生长炉的构造以及技术原理，并阐述了该生长法在晶体生长领域的应用情况。During the last few years, optical floating zone method was intensively applied for crystal growth of intermetallic and oxide materials due to its advantages for container-free, without contamination and high growth speed, which is superior in some key features compared to other commercial crystal growth methods. Therefore, it is a widely used method for crystal growth for research purposes. In this paper, we discussed the structures and principles of optical floating zone furnace, meanwhile, the application of floating zone technique in crystal growth was also detail introduced.

关 键 词：光学浮区法 晶体生长 应用 

分 类 号：O782[理学—晶体学]