锡基氧化物薄膜的制备及结构表征  

Preparation and structure of tin-based oxide thin film

作　　者：张宏斌[1] 祝要民[1] 裴世轻[1] 李董轩[1] 赵胜利[1] 

机构地区：[1]河南科技大学材料科学与工程学院,河南洛阳471003

出　　处：《功能材料》2007年第A04期1439-1441,共3页Journal of Functional Materials

基　　金：基金项目：国家自然科学基金资助项目（20203006）;国家重大基础研究计划（973计划）资助项目（ZM200103801）;河南科技大学科研基金资助项目（2003ZY42）;河南省教育厅自然科学计划资助项目（2006430005）

摘　　要：采用直流反应溅射并结合热处理工艺制备锡基氧化物薄膜（SnOx，1≤x≤2），利用扫描电镜（SEM）、能谱仪（EDX）、x射线衍射仪（XRD）考察退火温度对薄膜表面形貌、组成和结构的影响，并通过恒流充放电初步考察薄膜的电化学性能。研究结果表明，在400-600℃退火温度下制备的SnOx薄膜表面光滑、结构致密；随着退火温度的升高，薄膜中SnO的含量逐渐减少，SnO2的含量逐渐增加，薄膜的晶粒尺寸增大，大小为30-50nm；600℃退火2h获得的SnOx薄膜具有良好的电化学循环稳定性，有望成为高性能的全固态薄膜锂电池阳极材料。Tin base oxide （SnOx,1≤x≤2） thin film was prepared by direct-current reactive sputtering with heat treatment assist process. Scanning electron microscope （SEM）, energy dispersive X-ray （EDX） and X-ray diffraction （XRD） were used to inspect the influence of annealing temperature on its surface morphology, composition and structure. Furthermore, The electrochemistry performance of SnOx thin film was preliminary examined through the constant current charge-discharge technique. The results indicate that the dense SnOx thin films with smooth surface are obtained at 400-600℃ annealing for 2h. With the increase of annealing temperature, the SnO content gradually reduced while the SnO2 content increased and the particle size become larger （30-50nm）. The SnOx thin film annealed at 600℃ for 2h has superior electrochemical cycling properties and is expected to become high-performance anode material for all-solid-state thin film lithium ion battery.

关 键 词：锡基氧化物 薄膜 结构 直流溅射 

分 类 号：TM911[电气工程—电力电子与电力传动]