Deposition of chromium aluminum nitride coatings by arc ion plating  

作　　者：张淑娟 李明升 冯长杰 刘庭芝 多树旺 

机构地区：[1]Jiangxi Key Laboratory of Surface Engineering,Jiangxi Science and Technology Normal University [2]Department of Materials Science and Engineering,Nanchang Institute of Aeronautical Technology

出　　处：《中国有色金属学会会刊：英文版》2007年第A02期780-784,共5页Transactions of Nonferrous Metals Society of China

基　　金：Project(50401022) supported by the National Natural Science Foundation of China;Project(0650034) supported by the Natural Science Foundation of Jiangxi Province, China

摘　　要：Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology,deposition rate and phase structure were investigated. As the aluminum content increases,the structure of(Cr1-xAlx)N changes from B1(NaCl) phase to B4(wurtzite) phase. The critical content of AlN solubilized in B1(NaCl) lattice is close to 0.7. With the increasing pulse negative bias,the deposition rate decreases constantly,the droplet contamination is more serious,the ion-etching effect on coating surface is more obvious,and the change of preferred orientation and the shift of XRD peak take place.Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology, deposition rate and phase structure were investigated. As the aluminum content increases, the structure of （Cr1-xAlx）N changes from Bl（NaCl） phase to B4（wurtzite） phase. The critical content of A1N solubilized in B 1 （NaCl） lattice is close to 0.7. With the increasing pulse negative bias, the deposition rate decreases constantly, the droplet contamination is more serious, the ion-etching effect on coating surface is more obvious, and the change of preferred orientation and the shift of XRD peak take place.

关 键 词：铬铝氮涂层 电弧离子电镀法 电沉积 相变 

分 类 号：TG174[金属学及工艺—金属表面处理]