脉冲频率对电沉积Ni镀层组织和性能的影响  

The Effect of Pulse Frequency on the Microstructure and Tensile Properties of Ni Sheets

作　　者：王子涵[1] 杨滨[1] 铁军 姜涛 杨玉国[3] 张济山[1] 

机构地区：[1]北京科技大学 新金属材料国家重点实验室,北京100083 [2]北京中康达纳米技术有限公司,北京100005 [3]北京交通大学,北京100044

出　　处：《稀有金属材料与工程》2007年第A03期620-622,共3页Rare Metal Materials and Engineering

基　　金：国家高技术研究和发展计划(863)资助项目(No.2002AA302502)

摘　　要：研究了脉冲频率对Ni镀层组织和性能的影响。X射线衍射(XRD)、场发射扫描电镜(FEG-SEM)测试表明,提高脉冲频率可以细化Ni镀层晶粒。实验范围内,随着脉冲频率的增加,Ni镀层抗拉强度和硬度提高。The effect of pulse frequency on the microstructure and tensile properties of Ni sheets produced by pulsed-electrodeposition technique was studied. XRD and FEG-SEM results show that the grain size of Ni sheets was refined with increasing pulse frequency. The tensile strength and hardness of the Ni sheets were improved with the increase of pulse frequency used in this experiment.

关 键 词：脉冲电沉积 频率 Ni镀层 

分 类 号：TG174.4[金属学及工艺—金属表面处理]