8.0nm反射式偏振膜的设计和制备  

Designing and Fabrication of Multilayer Polarization for Soft X-ray at 8.0 nm

作　　者：吕超[1] 易葵[1] 邵建达[1] 

机构地区：[1]中国科学院上海光学精密机械研究所薄膜中心,上海201800

出　　处：《光子学报》2007年第11期2049-2052,共4页Acta Photonica Sinica

基　　金：国家863高技术研究发展计划(2005AA847033)资助

摘　　要：讨论了软X射线反射式偏振膜的设计原理和方法,利用设计软件模拟设计了8.0nm处的Mo/B4C偏振膜.对影响多层膜性能的参量进行了详细的误差分析.利用磁控溅射镀膜机进行了偏振膜的制备研究,X射线小角衍射测量了多层膜的周期厚度,测量数据的拟合结果与设计值吻合很好.The design principle and method of multilayer polarizing elements for soft x-ray region was discussed. The Mo/B4 C multilayer was designed by 8 nm designing software. Parameter of the multilayer structure was studied and the impact of their misnomer on the multilayer polarizing elements was analyzed. Mo/B4 C multilayer was fabricated by magnetron sputtering and proved that it has perfect periodic structure through small angle XRD research. The period of the multilayer is 5. 76 nm and it is quite near to our devise.

关 键 词：多层膜 软X射线 偏振 准布儒斯特角 

分 类 号：O434.14[机械工程—光学工程]