渗透胁迫下硼对细胞膜的保护作用  

THE PROTECTION OF BORON ON PLASMA MEMBRANE UNDER OSMOTIC STRESS

作　　者：王喜庆[1] 唐韬 汪沛洪[1] 

机构地区：[1]西北农业大学植物生理生化教研室,陕西杨陵712100

出　　处：《植物营养与肥料学报》1997年第3期218-223,共6页Journal of Plant Nutrition and Fertilizers

基　　金：西北农业大学青年基金

摘　　要：选用秦油2号油菜为供试材料，研究不同硼（B）浓度对植株的生长状况及细胞膜功能的影响。测定结果表明:油菜生长的最适硼浓度为0.5mg／L，B浓度过高或过低对植株抑制严重;在不同水势条件下处理，适宜的B浓度可以降低渗透胁迫对质膜的伤害，提高作物抗旱性。Rape (Brassica napus) No.2 Qinyou. the sensitive species to boron deficiency is chosen as test material. Shoot and root length. plant dry weight, leaves area and plasma memmbrane permeability were measured. Effect of optimum B supply on the plasma membrane permeability of isolated leaves with deficient supply of B under osmotic sttess were also measured. Boron function is studied under normal condition and osmotic stress. Result indicated that 0. 5mg/L is the optimum concentration to rape growth, no matter which concentrations are lower and higher than 0. 5mg/L. plasmma membrane function are hurted under osmotic stress. Optimum B concentration could reduce the hurt of osmotlc stress. improve its resistant to drought.

关 键 词：硼 渗透胁迫 细胞膜 

分 类 号：Q945.14[生物学—植物学]