共沉淀纳米掺杂制备ZnO压敏电阻数学模拟(Ⅰ)  

A Model of Coprecipitation Doping for Preparing ZnO Varistor Ceramic Powders: Part I

作　　者：林枞[1] 徐政[1] 孙丹峰[2] 

机构地区：[1]同济大学材料科学与工程学院,上海200092 [2]苏州中普电子有限公司,江苏苏州215011

出　　处：《同济大学学报（自然科学版）》2007年第11期1515-1519,共5页Journal of Tongji University:Natural Science

摘　　要：从多种离子反应平衡角度,对最常见的氨法共沉淀过程进行理论分析,并在此基础上提出了氨法共沉淀的数学模型和计算方法.对ZnO压敏电阻粉体共沉淀反应中的既能与NH3也能与OH-络合的金属离子(A类二价金属离子)进行了理论分析和模拟计算,得到了沉淀反应中沉淀系数、络合反应系数及pH值和氨水添加量之间的关系.This paper presents a theoretical investigation on the coprecipitation coating doping by ammonia for preparing ZnO varistor ceramic powders. The metal ions which can complex with both ammonia and hydroxyl are studied by a numerical simulation method on the basis of the mechanism of balance on multi-ions reaction. The dependences of coprecipitation rate, side reaction rate and pH value on the ammonia contents are revealed and discussed.

关 键 词：ZNO压敏电阻 共沉淀 数学模拟 

分 类 号：TB44[一般工业技术] TB381