丙烯基硫脲对镍阳极溶出和阴极沉积过程影响  

Effect of ATU on Nickel Anodic Dissolution and Cathodic Deposition

作　　者：卢江红[1] 郑子山[1] 林进妹[1] 陈碧桑[1] 陈国良[1] 

机构地区：[1]漳州师范学院化学与环境科学系,福建漳州363000

出　　处：《漳州师范学院学报（自然科学版）》2007年第4期78-82,共5页Journal of ZhangZhou Teachers College（Natural Science)

基　　金：福建省教委科研基金资助项目(JA07160)

摘　　要：采用循环伏安(CV)和电化学石英晶体微天平(EQCM)方法研究了硫酸镍溶液中Ni在Pt电极上阳极溶出和阴极沉积过程以及丙烯基硫脲(ATU)对该过程的影响.结果表明,在0.05M的NiSO4溶液中,镍阳极溶出和阴极沉积过程的M/n实验值分别为31.7和38.0 g/mol,都是两电子过程.在含ATU的NiSO4溶液中,镍在铂电极上阳极溶出和阴极沉积过程共出现3个电流峰,其M/n实验值分别为60.4、117.1和60.0 g/mol,表明ATU改变了镍的电极过程,对镍的阳极溶出和阴极沉积有比较复杂的影响;CV结果还证实:ATU促进了镍的阳极溶出和阴极沉积过程.本文还从电极表面质量定量变化的角度提供了Ni阳极溶出和阴极沉积过程的新数据.The anodic dissolution and Cathodic deposition of Ni on Pt electrode and effect of allyl thiourea （ATU） on the processes in NiSO4 solution were investigated by using Cyclic Voltammetry （CV） and electrochemical quartz crystal miCrobalance （EQCM）. The experimental results demonstrated that the M/n value in the anodic dissolution and cathodic deposition of Ni in 0.05M NiSO4 solution is 31.7 and 38.0 g/mol, respectively, showing that the anodic dissolution and cathodic deposition of Ni correspond to the two-electron processes. In 0.05M NiSO4 solution with ATU, there are three current peaks in the anodic dissolution and cathodic deposition of Ni on Pt electrode, the M/n values of which are 60.4, 117.1 and 60.0 g/mol, respectively; which demonstrated that ATU may change the mechanism of the anodic dissolution and cathodic deposition of Ni on Pt electrode and have complicated effect on anodic dissolution and cathodic deposition of Ni. The CV experimental results demonstrated that ATU may accelerate the mechanism of the anodic dissolution and cathodic deposition of Ni. The EQCM studies provided quantitative results of surface mass changes during anodic dissolution and cathodic deposition of Ni.

关 键 词：NI EQCM 电沉积 阳极溶出 丙烯基硫脲 

分 类 号：O646.54[理学—物理化学] O433[理学—化学]