光学元件清洗过程中同步辐射活化氧的研究(英文)  

Research of oxygen activation by synchrotron radiation in optical component cleaning process

作　　者：钟鹏飞[1] 周洪军[2] 霍同林[2] 张国斌[2] 郑津津[1] 

机构地区：[1]中国科学技术大学精密机械与精密仪器系,安徽合肥230027 [2]中国科学技术大学国家同步辐射实验室,安徽合肥230029

出　　处：《光学精密工程》2007年第12期1921-1925,共5页Optics and Precision Engineering

基　　金：Supported by NSF of China (No 10575097;No 60473133);the "Hundred Talented" Projects from ACS,the 973 Project (No 2006CB303102);the SRFDP (No 20060358050),and the 111 Projects

摘　　要：在同步辐射应用中,光学元件被污染是一个常见问题,而光学元件的污染会造成光通量的极大损失。为了有效地清洗光学元件,研究了清洗过程中的光化学反应,进行了氧气在同步辐射光作用下分解的实验。通过对实验中产生的气体成份分析,进行光化学反应研究。首先,测量通氧气时的气体成份;然后,测量通氧气和同步辐射光照时的气体成份。通过两者比较,分析氧气分解的情况。实验结果表明,氧分子在同步辐射光作用下发生分解,产生质量数为16的氧原子、氧离子和质量数为48的臭氧,它们的成份分别占1 %和0 .005 %～0 .01 %。In order to optimize the optical component cleaning process, the oxygen dissociation by synchrotron radiation has been researched by analyzing the gas composition produced in cleaning process. The gas composition is measured by quadrupole mass spectra when synchrotron radiation light irradiates the oxygen filled in vacuum chamber. The gas composition and content can be established by analyzing the data gathered. Experimental results indicate that oxygen can be dissociated by synchrotron radiation light to produce some species with strong oxygenation, such as oxygen atom and ozone. The content of oxygen atom is about 1% and the content of ozone is about 0. 005%-0.01% in cleaning process.

关 键 词：同步辐射 活化氧 氧原子 臭氧 

分 类 号：O432.1[机械工程—光学工程] O644.1[理学—光学]