纳米氮化锆薄膜的光学性能研究  

STUDY ON OPTICAL PROPERTY OF NANO ZIRCONIUM NITRIDE FILMS

作　　者：黄佳木[1] 王亚平[1] 张兴元[1] 

机构地区：[1]重庆大学材料学院,重庆400045

出　　处：《太阳能学报》2007年第12期1308-1311,共4页Acta Energiae Solaris Sinica

摘　　要：采用射频磁控溅射法在载玻片和硅片上制备了纳米氮化锆薄膜。结果表明,纳米氮化锆薄膜(10～29nm)呈非晶态,其光学特性在波长380～2700nm的范围内平均可见光透过率为82.86%,平均反射率低至10.78%。扫描隧道谱(SIS)分析表明薄膜禁带宽度E_g为2.99 eV,在可见光范围内光子多为透过,反射和吸收较弱。从薄膜的X光电子能谱图(XPS)可知,薄膜表面存在大量的ZrO_2,对于纳米级的氮化锆薄膜而言,表面相ZrO_2对整体光学性能的影响较大。Nanon zirconium nitride films were deposited on glass substrates by RF reactive magnetron sputtering. The results showed that the nano-ZrN films are amorphous, which exhibited very different optical properties from normal ZrN film. The optical properties from the wavelength of 380 nm to 2500 nm of the film were analyzed with the UV/VIS/IR spectrophotometer. The average optical transmission was 82.86% and the average optical reflection was 10.78%. STS spectra of ZrN indicates that the band gap is 2.99eV and the free electrons of the films are lower, which lead to nearly no absorption of visible light. XP3 spectra showed that the ZrO2 on the surface influences the optical property of nano-ZrN films.

关 键 词：薄膜光学 纳米氮化锆 电子结构 氧化锆 

分 类 号：TB43[一般工业技术]