等离子体电解氧化陶瓷膜的工艺研究  

Technology research of plasma electrolytic oxidation ceramic coatings

作　　者：刘黎[1] 危立辉[2] 

机构地区：[1]中南民族大学计算与实验中心 [2]中南民族大学电子信息工程学院,湖北武汉430074

出　　处：《武汉工程大学学报》2007年第3期55-58,共4页Journal of Wuhan Institute of Technology

基　　金：国家民委科研资助项目(05ZN03)

摘　　要：利用等离子体电解氧化技术在铝合金6063表面生成了氧化物陶瓷膜.测试了氧化膜表面厚度和硬度,观察了膜层表面形貌,分析了氧化陶瓷膜的成分,探讨了不同电流密度对形成陶瓷膜厚度和硬度的影响.结果表明:铝合金6063表面陶瓷膜的厚度和硬度随电流密度的增大而提高,但有一极限值平均电流密度极限值为25 A/dm2.;随氧化时间的延长而增厚增硬,但也有一极限值,氧化时间极限值为45 min.This paper introduces the forming of ceramic oxide coating on the surface of aluminum alloy 6063 with plasma electrolytic oxidation technology. The hardness and thickness of the microarc oxidation coatings were tested, The surface morphology of the coatings were observed, The component of ceramic coatings were analysed, the effect of different current density for the hardness and thickness of ceramic coatings was discussed. The result shows that the hardness and thickness of ceramic coatings on aluminum alloy 6063 increase with current density, oxidizing time ,but the hardness and thickness of ceramic coatings can＇t be infinitely increased,and at last kept to a limit. The limit of average current density is 25 A/dm^2. The oxidizing time is 45 min.

关 键 词：等离子体电解氧化 铝合金 氧化陶瓷膜 XRD衍射图谱 

分 类 号：TG146.2[一般工业技术—材料科学与工程]