硅材料表面印迹技术研究进展  

Advances in Surface Molecular Imprinting Technique on Silica Material

作　　者：邴乃慈[1] 李庆华[1] 许振良[2] 

机构地区：[1]上海第二工业大学城市建设与环境工程学院,上海201209 [2]华东理工大学化学工程所,上海200237

出　　处：《化学世界》2007年第12期754-757,共4页Chemical World

基　　金：国家自然科学基金青年基金(50503011);上海市"浦江人才计划"(05PG14051);上海市重点学科建设项目(No.P1701)资助

摘　　要：综述了近年来通过把分子识别位点建立在基质材料的表面,来提高识别位点与印迹分子的结合速度,进一步加强印迹材料吸附分离效率的分子印迹技术,即表面印迹技术的研究进展。主要从以硅为基质材料方面综述了表面分子印迹技术的发展现状,对最近几年基于硅表面修饰的分子印迹技术的制备与应用的最新进展进行了总结与评述,并对其将来的发展进行了展望。The surface molecular imprinting technique can improve the binding rate between recognition sites and imprinted molecules, and the adsorption efficiency of the imprinted materials can be improved by designing the molecular recognition sites on the surface of imprinted materials. This paper mainly focuses on the silica surface imprinting technique. The latest development in the preparation and recognition of molecular imprinted polymers on the surface of silica materials are reviewed and discussed. The prospect of molecular imprinting technique is also proposed.

关 键 词：分子印迹 表面修饰 硅材料 综述 

分 类 号：O658.2[理学—分析化学]