宽台栽培大豆叶面积动态及净光合生产率  

LAI TRENDS AND NAR OF SOYBEAN IN WIDE-RIDGE CULTURE

作　　者：何庸[1] 张荣华[1] 程学刚[1] 

机构地区：[1]黑龙江省农垦科学院作物所,佳木斯1540007

出　　处：《中国油料》1997年第3期41-43,共3页

基　　金：黑龙江省科委资助项目

摘　　要：采用小区试验测定了宽台栽培、70cm行距垄作、30cm行距平作大豆的叶面积指数（LAI）和净光合生产率（NAR）。结果表明，LAI呈正态曲线变化，从大豆出苗至LAI高峰时期，宽台栽培的最大LAI出现时间比垄作和平作推迟3～6d，LAI捉高0．275～0．404，LAI＞4的天数延长5～11d。生育期平均NAR比垄作和平作高0．37～0．829／m2·d。LAI (leaf area index) and NAR (net assimilation rate) of soybean in wideridge culture, 70cm row with redge-planting and 30cm row with flat-planting was studied in a plot experiment. The result showed that the LAI increased in normal curve from emergence stage to LAI peak stage, and the time of max LAI appearance of wide-ridge culture delayed 3～6 days and the LAI was 0. 275～0. 404 higher than that of ridge-planting and flatplanting. The days of LAI>4 prolonged 5～11days. The average NAR in soybean of wideridge culture was 0. 37～0. 82g/m2·d more than that of ridge-planting and flat-planting.

关 键 词：大豆 宽台栽培 叶面积指数 净光合生产率 

分 类 号：S565.101[农业科学—作物学]