ICP-AES法测定高纯二氧化锆中痕量杂质  

Determination of Trace Impuritise in High-Purity Zirconium Oxide by ICP-AES

作　　者：马晓国[1] 郑文裕[1] 

机构地区：[1]广东工业大学分析测试中心,广州市东风东路729号510090

出　　处：《光谱实验室》1997年第3期88-89,共2页Chinese Journal of Spectroscopy Laboratory

摘　　要：介绍了高纯二氧化锆中痕量杂质元素Fe、Na、Si、Ti的ICP－AES测定方法。样品以浓H2SO4及（NH4）2SO4溶解，采用空白背景校正法消除基体Zr的光谱干扰，以基体匹配法补偿基体效应。各元素平均回收率为95％—106％，相对标准偏差为1．3％—3．0％。This paper describes the method for the determination of trace Fe,Na,Si and Ti in high-purityzirconium oxide by ICP-AES. The samples were dissolved by sulfUric acid and ammonium sulfate.Spectral interferences were corrected by blank background correction technique and matrin effect was compensated by using matris matchinS' The recoveries are within 95% - 106 % and relative standard dehation within 1. 3 % - 3. 0% .

关 键 词：ICP-AES 二氧化锆 杂质 

分 类 号：O614.412[理学—无机化学] O657.3[理学—化学]