镀铬对光刻胶全息光栅掩模槽形的影响  

Influence of chromeplating to the profile of holographic grating mask of photoresist

作　　者：陈刚[1] 吴建宏[2] 刘全[2] 

机构地区：[1]南京信息职业技术学院微电子工程系,江苏南京210046 [2]苏州大学信息光学工程研究所,江苏苏州215006

出　　处：《光学仪器》2007年第6期81-84,共4页Optical Instruments

基　　金：江苏省高技术研究计划资助项目(BG2004020)

摘　　要：为了研究镀铬对光刻胶光栅掩模槽形的影响,分析了铬膜反射引起的沿垂直光刻胶表面的驻波效应。分析表明驻波效应的对比度为0.28,不能忽略。将镀铬基底与普通的玻璃基底的掩模槽形对比,发现明显的不同。槽形模拟表明这种不同是由于驻波效应引起的。驻波效应会使掩模形成阶梯结构,且阶梯高度差正好为驻波波节间距离。In order to study the influence to the final profile of the holographic grating mask of photoresist when chrome film is plated on substrate of glass, the standing wave effect normal to the surface of the photoresist due to the reflection on the surface of chrome film is analyzed theoretically. Analysis indicates that the standing wave effect whose contrast reaches 0. 28, can not be neglected. Comparison between the profiles made on top of chrome film substrate and on top of glass substrate shows obvious difference due to the standing wave effect according the simulation of the profile. Standing wave effect will cause the step structure of the profile of the grating mask, and the height difference of the step structure is just the distance between the nodes of the standing wave.

关 键 词：衍射光栅 全息光栅掩模 铬膜 槽形 

分 类 号：O436.1[机械工程—光学工程]