Realization of absolute negative refraction index by a photonic crystal using anisotropic dielectric material  

作　　者：方云团 欧阳征标 

机构地区：[1]Department of Physics,Zhenjiang Watercraft College [2]THz-Technology Research Center of Shenzhen University

出　　处：《Chinese Optics Letters》2008年第1期57-60,共4页中国光学快报（英文版）

基　　金：This work was supported by the National Natural Science Foundation of China(No.60471047);the Natural Science Foundation of Guangdong Province(No.04011308);the Shenzhen Bureau of Science and Technology

摘　　要：A method to realize absolute negative refraction index -1 with a two-dimensional （2D） photonic crystal is presented by introducing dielectric anisotropy in the photonic crystal material. The band structures of E-polarization mode and H-polarization mode can be adjusted by changing the parameters of materials. Thus the two modes with different polarizations have the same negative refraction index -1 for the same frequency. The results are demonstrated by numerical simulation based on the finite-difference time-domain （FDTD） method.A method to realize absolute negative refraction index -1 with a two-dimensional （2D） photonic crystal is presented by introducing dielectric anisotropy in the photonic crystal material. The band structures of E-polarization mode and H-polarization mode can be adjusted by changing the parameters of materials. Thus the two modes with different polarizations have the same negative refraction index -1 for the same frequency. The results are demonstrated by numerical simulation based on the finite-difference time-domain （FDTD） method.

关 键 词：Realization of absolute negative refraction index by a photonic crystal using anisotropic dielectric material mode EFS 

分 类 号：O436[机械工程—光学工程]