多孔TiO2／Al／SiO2纳米复合结构的紫外光吸收特性研究  

Investigation of the UV absorption of porous TiO_2/Al/SiO_2 nanostructures

作　　者：马保宏[1] 李燕[1] 王成伟[1] 王建[1] 陈建彪[1] 刘维民[2] 

机构地区：[1]西北师范大学物理与电子工程学院,兰州730070 [2]中国科学院兰州化学物理研究所固体润滑国家重点实验室,兰州730000

出　　处：《物理学报》2008年第1期586-591,共6页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:10774121);西北师范大学三期科技创新工程项目(批准号:NWNU-KJCXGC-03-22);青年教师科研基金(批准号:NWNU-QN-05-27)资助的课题~~

摘　　要：在SiO2玻璃衬底上用脉冲激光沉积(PLD)技术,分别沉积Ti和Ti/Al膜,经电化学阳极氧化成功制备了多孔TiO2/SiO2和TiO2/Al/SiO2纳米复合结构.其中TiO2薄膜上的微孔阵列高度有序,分布均匀.实验研究了Al过渡层对多孔TiO2薄膜光吸收特性的影响.结果表明:无Al过渡层的多孔TiO2薄膜其紫外吸收峰在270nm处,且峰强不随阳极氧化工艺参数调节;而有Al过渡层的多孔TiO2薄膜其紫外吸收峰红移至293nm处,峰强和峰形不仅受阳极氧化电压调节而且受Al过渡层厚度的影响也很敏感.进一步分析了两种结构在吸收边附近的光跃迁特性.这些结果对基于多孔TiO2的光伏电池和紫外光传感器的应用研究非常有益.The porous TiO2/SiO2 and TiO2/A1/SiO2 nanostructures are successfully fabricated by anodic oxidation of titanium or titanium/aluminum thin films deposited on transparent SiO2 glass substrates with pulsed laser deposition （PLD） technique. The optically transparent titania films, with highly ordered and uniformly arrayed pores are characterized by field emission scanning electron microscope （FESEM）. The influence of A1 buffer layer on the optical absorption of the porous TiO2 thin films was investigated. The results show that without A1 buffer layer the UV absorption peak of the porous TiO2 131ms was fixed at 270 nm and the intensity of absorption peak was not modulated by the anodic potential. However, with an A1 buffer layer, the UV absorption peak will shift to 293 nm, and the intensity of absorption peak was not only modulated by anodic potential, but also sensitively influenced by the thickness of A1 buffer layer. Moreover, the optical transition property of the two nanostructures at the absorption edge was analysed.

关 键 词：多孔 TIO2 薄膜 阳极氧化 紫外光吸收 

分 类 号：O482.3[理学—固体物理]