一种旋转阳极PCVD炉设计  

A New Design for PCVD Furnace

作　　者：刘军海[1] 陆明珠[1] 苏启生[1] 

机构地区：[1]西安交通大学材料学院

出　　处：《表面技术》1997年第3期26-27,共2页Surface Technology

摘　　要：根据当前等离子体化学气相沉积(PVCD)炉所存在的电场及供气分布不均等问题,提出了一种新的设计方案。其特征在于真空室内的阳极筒由控制电机通过传动机构带动旋转,反应气体通过旋转的气流分配系统导入真空室;本设计的预期效果是在进行PCVD处理时,通过旋转校正阳极筒椭圆度和工作时自身变形所造成的电场分布不均,并能使反应气体在工件大面积内达到均匀分布,以提高表面沉积层的厚度一致性及其致密性。A new preliminary design programme for plasma-assisted chemical vapour deposition(PVCD) furnace due to inltomogeneity of electric field and reaction gases inthe existing furnace is presented. The key of this design is that in the vaccumchamber of the furnace,anode bucket and gas tube with holes on it can be drived to spin by motor through transmission mechanism. The desired results of this design are that well distribution of electric field can be ceached by rotation of anode bucket,and also improving homogeneity of reaction gases on processed workpieces.

关 键 词：PCVD 旋转阳极 阳极 金属镀膜炉 

分 类 号：TG174.44[金属学及工艺—金属表面处理]