三价铬电镀装饰铬工艺及特性研究  

Process for Electroplating of Trivalent Chromium Decorative Coating and Its Characteristics

作　　者：郑剑[1] 屠振密[1] 李宁[1] 张景双[1] 杨闯[1] 

机构地区：[1]哈尔滨工业大学(威海)应用化学系,山东威海264209

出　　处：《材料保护》2008年第1期24-27,共4页Materials Protection

摘　　要：研究了一种以甲酸、乙酸及第三种配位剂组合的三价铬电镀工艺,并对该镀液和镀层进行了性能测试。测试结果显示,该体系所得镀层外观光泽明亮,光亮电流密度范围宽(可使用的电流密度从2.5～25.0A/dm2);镀液的pH值容易控制,分散能力和覆盖能力好,可在室温下电镀,镀液性能比较稳定;通过Taf-el测试和CASS试验证明,三价铬镀铬层的耐蚀性和六价铬镀层相当。The process for the electroplating of trivalent chromium from the plating bath containing formic acid,acetic acid,and a third complexing agent as the combinative completing agent was established.The performance of the plating bath was examined,while the corrosion resistance of the Cr coating was evaluated using Tafel curve test and CASS test as well.It was found that the plating bath had good stability,cov-erying capability,and throwing power.At the same time,the plating bath was applicable to the electroplating at ambient temperature,and its pH value could be easily controlled.The resulting trivalent Cr coating was bright and could be obtained within a broad range of current density from 2.5 A/dm2 to above 25.0 A/dm2,while its corrosion resistance was comparable to that of electroplated bexavalent Cr coating.

关 键 词：三价铬电镀 六价铬 特性 耐蚀性 Tafel曲线 CASS试验 

分 类 号：TQ153[化学工程—电化学工业]