在VDR渗氮炉中进行的真空脉冲渗氮  被引量:3

Vacuum Pulse Nitriding in VDR Nitriding Furnace

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作  者:姚一平 

机构地区:[1]上海纳铁福传动轴有限公司,上海201315

出  处:《热处理》2008年第1期63-65,67,共4页Heat Treatment

摘  要:在VRD渗氮炉中对H13、Cr12MoV和45钢进行真空脉冲渗氮,采用氮气和氨气作渗剂,渗氮温度为540℃,渗氮零件有冲头、凹模、热锻模等。VRD真空脉冲渗氮炉配备有计算机控制系统、排气系统、特殊的搅拌风机和密封装置以及冷却系统。在VRD渗氮炉中进行真空脉冲渗氮具有渗速快、渗层均匀、渗层脆性小以及废气不污染环境等优点。H13, Crl2MoV and 45 steels were vacuum-pulse nitrided by using nitrogen and ammonia in the VDR nitriding furnace at 540℃. The nitrided parts had covered punch, female die, hot forging die and so forth. The VDR nitriding furnace was equiped with computer control and exhaust systems, special agitating blower and sealing unit as well as cooling system. Advantages of the vacuum pulse nitriding in the VDR furnace were increased nitriding rate, uniform nitrided ease, low ease brittleness and exhaust gas unharmful to environment and so on.

关 键 词:真空脉冲渗氮 VDR渗氮炉 渗氮气氛 

分 类 号:TG156.82[金属学及工艺—热处理]

 

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