Dynamical Analysis of Sputtering at Threshold Energy Range： Modelling of Ar＋Ni（100） Collision System  

作　　者：HUNDUR Yakup GUVENC Ziya B HIPPLER Rainer 

机构地区：[1]Department of Physics, Istanbul Technical University, Istanbul, TR-34469, Turkey [2]Electronic and Communication Engineering, Cankaya University, Balgat, Ankara, TR-06530, Turkey [3]Institut für Physik, Ernst-Moritz-Arndt Universitate Greifswald, Greifswald, D-17489, Germany

出　　处：《Chinese Physics Letters》2008年第2期730-733,共4页中国物理快报（英文版）

摘　　要：The sputtering process of Ar＋Ni（100） collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni（100） slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data.The sputtering process of Ar＋Ni（100） collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni（100） slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data.

关 键 词：SURFACE YIELD 

分 类 号：O572.214[理学—粒子物理与原子核物理]