Novel optical lithography using silver superlens  

作　　者：秦海燕 李璇 申溯 

机构地区：[1]Centre for Optical and Electromagnetic Research Zhejiang University [2]Joint Research Center of Photonics of the Royal Institute of Technology and Zhejiang University(JORCEP) [3]The Institute of Information Optical Engineering Soochow University

出　　处：《Chinese Optics Letters》2008年第2期149-151,共3页中国光学快报（英文版）

基　　金：the National Basic Research Program under Grant No.2004CB719801

摘　　要：This work has demonstrated that with silver superlens, the resolution of conventional optical lithography can be improved significantly. Experimental and simulative results are given to verify the facts that the resolution and the pattern fidelity are sensitive to the contact tightness between layers.This work has demonstrated that with silver superlens, the resolution of conventional optical lithography can be improved significantly. Experimental and simulative results are given to verify the facts that the resolution and the pattern fidelity are sensitive to the contact tightness between layers.

关 键 词：PMMA Novel optical lithography using silver superlens very NM 

分 类 号：O439[机械工程—光学工程]