脉冲激光沉积非晶碳-聚酰亚胺复合薄膜的场致电子发射研究  

Field Electron Emission from Pulsed Laser Deposited Amorphous Carbon-polyimide Composite Films

作　　者：李运钧[1] 何金田[1] 姚宁[1] 张兵临[1] 龚知本[2] 

机构地区：[1]郑州大学物理系及河南省基础及应用科学研究所,郑州450052 [2]中国科学院安徽光机所,合肥230031

出　　处：《中国激光》1997年第10期952-956,共5页Chinese Journal of Lasers

摘　　要：利用脉冲激光沉积技术制备出非晶碳-聚酰亚胺复合薄膜,并观察到其场发射阈值场强(4V/μm)比类金刚石薄膜(>12V/μm)有较大的降低,最大发射电流密度为1.2mA/cm^2.利用透明导电薄膜阳极技术可观察电子在薄膜阴极表面的发射位置.并对该复合薄膜的场电子发射机理进行了初步探讨.实验表明该复合薄膜有可能作为一种新型的场发射冷阴极材料.在平面显示器件中得到应用.Amorphous carbon-polyimide composite thin films were deposited by pulsed laser deposition for the first time. The lower turn-on field of 7 V/μm, which was less than that of the previously reported amorphous diamond film, was obtained from the composite films and the emission current density was 1. 2 mA/cm2 which could be comparable with that of the chemical vapor deposied diamond films. The locations of electron emission sites were observed using a transparent conducting anode techanique, and then the effect of the surface microstructure on electron emission could be futher understood. The composite films could be competent for cold emitters applied in flat panel displays.

关 键 词：脉冲激光沉积 复合薄膜 场致电子发射 激光技术 

分 类 号：TN24[电子电信—物理电子学]