Ni-P底层对化学镀Co-P薄膜性能的影响  

The influence of Ni-P underlayer on electroless Co-P thin film properties

作　　者：王海成[1] 杜中美[1] 王立锦[1] 滕蛟[1] 李明华[1] 于广华[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083

出　　处：《功能材料》2008年第1期51-53,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50471093)

摘　　要：采用化学镀工艺制备了Co-P磁记录薄膜,研究了非晶无磁Ni-P底层对Co-P薄膜的生长及性能的影响。研究结果表明：非晶无磁Ni-P底层对Co-P薄膜的晶体结构及取向无明显影响,镀态的Co-P薄膜均为密排六方结构,（100）（、002）、（101）的择优取向无明显变化;但非晶无磁的Ni-P底层可以提高薄膜的均匀性和一致性,表面无明显缺陷;细化晶粒,平均晶粒尺寸为100-150nm;提高Co-P薄膜的磁性能,矫顽力可达4.54×10^4A/m。当记录信号脉冲时,与铝基体上直接施镀相比,在Ni-P底层上的Co-P磁记录薄膜输出信号幅值均匀稳定,信噪比良好。Magnetic recording Co-P thin films were prepared by electroless deposition. The influence of amorphous nonmagnetic Ni-P underlayer on Co-P thin film growth and properties was studied. The results indicated that , the amorphous nonmagnetic Ni-P underlayer didn＇t have an obvious effect on the structure and texture of the Co-P thin f lms. However , it can improve the uniformity , consistency and magnetic properties of the Co- P thin films, and refine the grains. When recorded pulse signals, the Co-P magnetic recording thin films with Ni-P underlayer have a uniform and steady output and good signal to noise ratio compared with that deposited directly on aluminium substrates.

关 键 词：化学镀 CO-P 磁记录薄膜 NI-P 

分 类 号：O484.4[理学—固体物理]