应用于FED的金刚石薄膜的光学和结构分析(英文)  

Structural and Optical Analysis of the Diamond Films for FED Application

作　　者：胡广[1] 王林军[1] 祝雪丰[1] 刘建敏[1] 黄健[1] 徐金勇[1] 夏义本[1] 

机构地区：[1]材料科学与工程学院,上海大学,上海200072

出　　处：《电子器件》2008年第1期249-251,255,共4页Chinese Journal of Electron Devices

基　　金：国家自然科学基金项目资助(60577040);上海市应用材料研究和发展基金资助(0404);上海纳米技术项目资助(0452nm051,0552nm046);上海市重庆学科资助(T0101)

摘　　要：本文比较研究了不同晶粒大小和结构的金刚石薄膜的场发射性质,这些金刚石薄膜通过热丝辅助化学气相沉积法( HFCVD)获得。研究结果表明纳米尺寸效应对金刚石薄膜的场发射性能有非常重要的影响,通过比较不同晶粒尺寸的金刚石薄膜发现纳米金刚石薄膜相对于大晶粒金刚石薄膜(比如微米级的金刚石薄膜)有更好的场发射性能。从拉曼光谱得到,含有一定量非金刚石相的金刚石薄膜有更好的场发射能力和更低的开启电场(E0)。另外,具有(111)定向的金刚石薄膜比起其他结构的金刚石薄膜,它的电子发射能力更强。Diamond films with different grain size and por deposition （HFCVD） method were evaluated on microstructure deposited by hot filament chemical vatheir field emission properties for FED applications. Nano-size effect plays a very important role in the performance of field emission of the nano-diamond film. Compared the films in different size, it has been found that nano-diamond films have better field emission behavior than films with large size grains, such as grains in the level of micron. From Raman spectra, diamond film with certain non-diamond components has shown best electron emission behavior and low turnon-field （E0）. Additionally, Electron emission behavior of the films with more （111） diamond grains is quite better than that of films with more other grains.

关 键 词：场发射 开启电场 发射电流 (111)定向金刚石薄膜 拉曼光谱 

分 类 号：TN304.55[电子电信—物理电子学]