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作 者:万宗跃[1,2] 张利 印仁和[1] 徐群杰[1,2] 陈浩[1] 朱律均[1] 周国定[2]
机构地区:[1]上海大学理学院化学系,上海200444 [2]上海电力学院环境工程系,国家电力公司热力设备腐蚀与防护重点实验室,上海200090 [3]阿美特克有限公司上海代表处,上海200030
出 处:《金属学报》2008年第2期203-208,共6页Acta Metallurgica Sinica
基 金:国家自然科学基金项目50371053和20406009;上海市曙光计划04SG55;上海市科委重点项目062312045;厦门大学固体表面物理化学国家重点实验室项目200512;上海市重点学科建设项目P1304资助~~
摘 要:利用3-氨基-1,2,4-三氮唑(ATA)金属处理剂在Cu-Ni合金表面制备了自组装单分了膜(SAMs),用电化学方法研究ATA SAMs对Cu-Ni合金的缓蚀作用及其吸附行为.结果表明,ATA分子易在Cu-Ni合金表面形成稳定的ATA SAMs,抑制了Cu-Ni合金的阳极氧化过程,改变了电极表面双电层结构,使零电荷电位正移,固/液界面双电层电容明显降低,有良好的缓蚀效果,这与交流阻抗和极化曲线得到的结论一致.同时研究表明ATA的吸附行为符合Langmuir吸附等温式,吸附机理是典型的化学吸附.By using 3-amino-i, 2, 4-triazole (ATA) as metal treatment reagent, the self assembled monolayers (SAMs) were prepared on the surface of Cu-Ni alloy, and its anticorrosion and adsorption mechanism have been investigated by electrochemical method. The results indicate that ATA is easy to transform into SAMs on the surface of Cu-Ni alloy. The SAMs change the structure of the double-electric layer and make the potential of zero charge (PZC) shift along a positive direction. In addition, the SAMs restrain the process of anodic oxidation and have well anticorrosion effect, which is in good agreement with the results obtained by EIS and polarization curve methods. Electrochemical measurements indicate that the corrosion resistance for Cu-Ni alloy electrode is improved by the ATA SAMs. Adsorption of the ATA SAMs follows the Langmuir's adsorption isotherm formula, and the adsorption mechanism is typical of chemisorption.
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