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作 者:ZHANG Sa-sa WANG Qing-pu ZHANG Xing-yu CHEN Jia-qi WANG Li
机构地区:[1]School of Information Science & Engineering, Shandong University, Jinan, 250100, China [2]Department of Electrical & Computer Engineering, The University of Texas at Austin, Austin Tx 78731, USA
出 处:《Optoelectronics Letters》2008年第2期133-136,共4页光电子快报(英文版)
基 金:the National Natural Science Foundation of China (Grant Nos 60677027 and 69978009)
摘 要:A three-sidewalls-prism holographic method has been provided for the fabrication of 3-D fcc-type polymeric photonic crystal using negative photoresist. Special fabrication treatment has been introduced to ensure the stability of the fabricated nanostructures. The scanning electronic microscopy (SEM) and the diffraction results testified the good dependability of the fabricated structures. The simulation of the partial band structure is in good agreement with the transmission and reflection spectra obtained by Fourier transform infrared spectroscopy.
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