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作 者:康进兴[1] 赵文轸[1] 徐英鸽[2] 孙立明[1]
机构地区:[1]西安交通大学 [2]西安建筑科技大学,陕西西安710055
出 处:《稀有金属材料与工程》2008年第2期366-369,共4页Rare Metal Materials and Engineering
摘 要:采用直流电沉积方法,通过改变特殊添加剂C7H4NO3SNa·2H2O浓度、沉积液温度、电流密度,制备出不同厚度的纳米晶镍覆层材料,利用高分辨透射电子显微镜(HRTEM)对沉积覆层材料的组织结构进行分析,从理论上推导了电流效率的计算公式,对不同工艺条件下电流效率的变化规律进行了研究。结果表明:电沉积纳米晶镍的电流效率可按ηk=2.4403×105v/ik计算得出;电沉积纳米晶镍的电流效率随着添加剂C7H4NO3SNa·2H2O浓度的增加而下降;随着电流密度和温度的增加先增加后下降,在温度60℃左右时最大。Nanocrystalline nickel electrodeposited coatings with different thicknesses were fabricated using the method of direct current deposition by changing the concentrations of the special additive C7H4NO3SNa·2H2O, bath temperature and current density. The microstructure was evaluated by means of high-resolution transmission electron microscopy (HRTEM). Law of current efficiency varying was studied. The results show that the nanocrystalline nickel coatings of uniform structure are fabricated by changing parameters of technology. The current efficiency of electrodeposited nanocrystalline nickel educe according to following formula, ηk=2.4403×10^5 v/ik. The current efficiency drops with the increasing of the concentrations of the additive C7H4NO3SNa·2H2O. The current efficiency increases firstly and then drops with increasing of the current density and the temperature. The maximam current density can be obtained at 60 ℃.
分 类 号:TQ153.12[化学工程—电化学工业]
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