TiAl合金表面等离子渗铬工艺  

PLASMA CHROMIZING TECHNOLOGY ON TiAl ALLOY SURFACE

作　　者：王小峰[1] 范莹[1] 王振霞[1] 贺志勇[1] 

机构地区：[1]太原理工大学表面工程研究所,太原030024

出　　处：《理化检验（物理分册）》2008年第2期57-60,70,共5页Physical Testing and Chemical Analysis(Part A:Physical Testing)

基　　金：山西省留学人员基金项目(2004-20)

摘　　要：用双层辉光离子渗金属技术，在TiAl合金表面渗入铬元素，形成合金层。研究了温度、气压、源极电压、阴极电压等工艺参数对渗层成分、厚度及显微组织的影响。结果表明，在源极电压700V、阴极电压450-280V、极间距18mm、试样温度1050℃、工作气压25Pa和保温时间4h的工艺参数条件下，渗铬层厚度可达60μm，渗层成分呈梯度分布，表面硬度明显提高。Chromizing treatment of TiAl intermetallic is conducted by double glow plasma metallic cementation technology and alloyed layer was formed on the surface. Effects of temperature, gas pressure, source electrode voltage and cathode voltage on composition, thickness and microstructure of the alloyed layer are studied systematically. According to the experiments, after 2 hours chromising at 1 050℃, the thickness of alloyed layer reaches 60 μm, the composition of the layer changes gradually with the depth, and the surface microhardness increased simultaneously.

关 键 词：TIAL合金 双层辉光 渗铬 

分 类 号：TG156.8[金属学及工艺—热处理]