超短脉冲激光烧蚀熔融硅的理论模型  

Theoretical model investigation about the mechanism of ultrashort-pulse laser ablation fused silica

作　　者：孙元征[1] 林晓辉[1] 陈云飞[1] 

机构地区：[1]东南大学机械工程学院,南京211189

出　　处：《功能材料与器件学报》2008年第1期38-42,共5页Journal of Functional Materials and Devices

基　　金：国家自然科学基金(No.50275026);江苏省自然科学基金(No.BK2002060)资助项目

摘　　要：在Fokker_Planck方程的基础上,对超短脉冲激光烧蚀熔融硅的机理进行分析研究,建立了雪崩电离、多光子吸收电离导致的熔融硅烧蚀机理的数学模型。其计算得出的激光能量密度和临界烧蚀阀值与实验结果很好的吻合,定量解释了超短脉冲激光对熔融硅烧蚀损伤微观过程的影响。Based on the Fokker_Planck equation, we analytically studied the mechanism of ultrashort pulse laser ablating fused silica, and establish the mathematical model of the fused silica ablation mechanism resulting from the avalanche ionization and muhiphoton ionization. The computational result about the critical laser energy density and ablation threshold is in agreement with the experimental result that quantitatively interprets the influence about ultrashort pulse laser on the microscopic processing of fused silica.

关 键 词：超短脉冲激光 烧蚀 雪崩电离 多光子吸收电离 

分 类 号：TN249[电子电信—物理电子学]