Formation mechanism of pulse current anodized film on AZ91D Mg alloy  

作　　者：钱建刚 王纯 李荻 郭宝兰 宋光铃 

机构地区：[1]School of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100083, China [2]CRC for Cast Metals Manufacturing, Division of Materials Engineering, School of Engineering, University of Queensland, Brisbane, Qld 4072, Australia

出　　处：《中国有色金属学会会刊：英文版》2008年第1期19-23,共5页Transactions of Nonferrous Metals Society of China

基　　金：Project(03H51016)supported by the Aeronautical Science Research Foundation of China;Project(2032009)supported by the Natural Science Foundation of Beijing,China

摘　　要：The kinetics of forming process of pulse current anodized film on AZ91D Mg alloy was studied by the voltage-time and thickness-time curves.The surface morphology,structure,elemental constitution and valences of the anodic films were analyzed by SEM,EDS,XPS and XRD respectively.The results show that the film-forming process can be divided into four stages.Formation of a dense layer before sparking is the first stage.Formation of a porous layer accompanied with slight sparking is the second stage.The third stage is characterized by fast growth of the porous layer accompanied with more intensive sparking.The fourth stage starts after the sparking process becomes even more vigorous and the pores become large.The kinetics of forming process of pulse current anodized film on AZ91D Mg alloy was studied by the voltage-time and thickness-time curves. The surface morphology, structure, elemental constitution and valences of the anodic films were analyzed by SEM, EDS, XPS and XRD respectively. The results show that the film-forming process can be divided into four stages. Formation of a dense layer before sparking is the first stage. Formation of a porous layer accompanied with slight sparking is the second stage. The third stage is characterized by fast growth of the porous layer accompanied with more intensive sparking. The fourth stage starts after the sparking process becomes even more vigorous and the pores become large.

关 键 词：镁合金 脉冲阴极氧化 薄膜成型 处理方法 

分 类 号：TG174.4[金属学及工艺—金属表面处理]