阿霉素在纳米钴修饰电极上的电化学行为及其应用  

Electrochemical behaviour of the adriamycin on the cobalt nanoparticles modified ITO electrode

作　　者：龚兰新[1] 魏翠梅[2] 胡劲波[2] 李启隆[2] 

机构地区：[1]新疆师范大学生命科学与化学学院,新疆乌鲁木齐830054 [2]北京师范大学化学学院,北京100875

出　　处：《药学学报》2008年第3期303-307,共5页Acta Pharmaceutica Sinica

基　　金：国家自然科学基金资助项目(20275007)

摘　　要：采用NaBH4,还原法制备了钴纳米粒,将其固定于氧化铟锡（ITO）电极上,首次制成了纳米钴修饰电极（NpCo/ITO）,并研究了阿霉素（adriamycin,ADM）在NpCo/ITO上的电化学性质。用循环伏安法（CV）、扫描电子显微镜（SEM）和能量色散谱（EDS）等对纳米钴修饰电极表面进行了表征。在纳米钴修饰电极上,阿霉素（ADM）在0.01 mol.L^-1KH2PO4-K2HPO4溶液（pH8.0）中,出现还原峰,峰电位为-0.67 V（vsAg/AgCl）,峰电流与ADM浓度在1.0×10^-8-2.0×10^-6mol.L^-1呈线性关系,检测限为5.0×10^-9mol.L^-1。循环伏安法研究表明,该体系属于具有吸附性的不可逆过程,NpCo/ITO对ADM的电化学还原过程产生较大的促进作用。A cobalt nanoparticles modified ITO electrode （NpCo/ITO） was prepared by casting cobalt nanoparticles onto ITO electrode and the cobalt nanoparticles were synthesized by NaHB, reduction. The electrochemical behaviors of adriamycin （ADM） on NpCo/ITO were studied. The modified ITO electrode was characterized by cyclic vohammetry （CV）, scanning electron microscopy （SEM） and energy dispersive spectroscopy （EDS）. In a 0.01 mol · L^-1 PBS （pH 8.0） buffer solution, a sensitive reduction peak of ADM was obtained. A linear relationship is held between the peak current and ADM concentration in the range of 1.0 × 10^-8 -2.0 × 10^-6 mol · L^-1 with detection of 5.0 × 10^-9 mol · L^-1 by cyclic vohammetry （CV） response. The reduction process was irreversible with adsorption at the NpCo/ITO electrode. The modified electrode showed an excellent electrocatalytic activity for the ADM electrochemical reduction.

关 键 词：纳米钴 阿霉素 电化学行为 修饰电极 

分 类 号：R917[医药卫生—药物分析学]