双层金属布线2μm CMOS万门门阵列(LC4750)工艺研究  

Study of 2μm CMOS Process for 10000 Gates Array with 2-level Matel Interconnect

作　　者：郭玉璞[1] 

机构地区：[1]电子工业部东北微电子研究所,沈阳110032

出　　处：《微处理机》1997年第1期16-19,27,共5页Microprocessors

摘　　要：介绍了双层金属布线2μm硅栅CMOS万门门阵列（LC4750）的研制过程、工艺设计和工艺控制，讨论了关键工艺的各种方法、条件及试验结果，并对新工艺线的工艺能力做了认真分析。In this paper, the process technology and manufacturing for 10000gates array with 2 levels matel interconnect is introduced. Specifically, the process design and control for this gate array are described with respect of the key process methods, conditions and experimental results. Finally, the process level for our new production line is analyzed.

关 键 词：集成电路 CMOS 门阵列 布线 

分 类 号：TN405.97[电子电信—微电子学与固体电子学]