低折射率纳米多孔二氧化硅薄膜的疏水性  

HYDROPHOBIC BEHAVIOR OF NANOPOROUS SILICA FILMS WITH LOW REFRACTIVE INDEX

作　　者：姚兰芳[1] 鲁凤芹[1] 岳春晓[1] 沈军[2] 吴广明[2] 

机构地区：[1]上海理工大学理学院物理系,上海200093 [2]同济大学波耳固体物理研究所,上海200092

出　　处：《硅酸盐学报》2008年第2期139-143,共5页Journal of The Chinese Ceramic Society

基　　金：上海市教育委会科研创新基金(08Y297)资助项目。

摘　　要：采用溶胶-凝胶技术,通过HCl控制酸性的酸/酸二步法,以十六烷基三甲基溴化氨为模板剂,正硅酸乙酯为硅源,以及水、盐酸等为原料,制备二氧化硅前驱体溶胶。用甲基三乙氧基硅烷(methyltriethoxysilane,MTES)改性,制各疏水型SiO_2前驱体溶胶。结果表明:采用MTES改性制备的二氧化硅薄膜的疏水性能、光学性能、力学性能等各项性能效果更好;通过简单提拉、迅速蒸发溶剂等方法制备的疏水薄膜的折射率为1.10,且在1.1～1.38之间连续可调,根据测得的折射率,计算的气孔率高达81.8%,介电常数为1.77。其红外光谱表明,所制备的薄膜由于掺入甲基基团而疏水,水滴在薄膜表面上的照片的结果进一步支持这一结论。A silica precursor sol was prepared by the sol-gel method and using tetraethoxysilane as silica source,cetyltrimethylammonium bromide as template surfactant and with hydrochloric acid and water as other raw materials.The silica precursor sol was then modified by methyltriethoxysilane（MTES）to obtain modified silica sol organically.The results show that the modified silica sol organically modified by MTES is better than that modified by hexame-thyldisihazane HMDS.Hydrophobic nanoporous silica film with a refractive index of 1.10 and adjusted from 1.1 to 1.38 can be prepared by evaporation-induced self-assembly process and MTES modification.The porosity and dielectric constant of the film are about 81.8% and 1.77,respectively.The infrared spectrum of the film indicates that the film is hydrophobic due to the introduction of the methyl groups and the picture of a drop of water on the film supports this result.

关 键 词：溶胶-凝胶 多孔二氧化硅 低折射率 疏水 甲基三乙氧基硅烷 

分 类 号：O469[理学—凝聚态物理]