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作 者:缪文彬[1] 王威[1] 仇玉兰[1] 吴灿军[1] 冀芳[1] 夏昭林[1]
机构地区:[1]复旦大学公共卫生学院劳动卫生教研室-公共卫生安全教育部重点实验室,上海200032
出 处:《复旦学报(医学版)》2008年第2期161-166,共6页Fudan University Journal of Medical Sciences
基 金:国家自然科学基金项目(30671740);国家973项目(2002CB512909);复旦大学研究生创新基金项目
摘 要:目的探讨碱基切除修复基因胸腺嘧啶DNA糖苷酶(TDG)、腺苷酸二磷酸核糖转移酶(ADPRT)和脱嘌呤/脱嘧啶核酸内切酶(APE1)基因多态与氯乙烯职业接触致外周血淋巴细胞染色体损伤易感性的关系。方法采用胞质分裂阻滞微核试验方法评价185名氯乙烯接触工人染色体损伤水平,应用创造酶切位点的限制性片段长度多态检测技术检测ADPRTVal762Ala和TDGGly199Ser基因位点的多态性,应用PCR-RFLP技术检测APE1Ile64Val基因多态位点。结果多因素Poisson回归分析结果表明,携带TDG199Gly/Ser+Ser/Ser基因型的氯乙烯接触工人发生染色体损伤的风险是携带TDG199Gly/Gly基因型工人的1.198倍(95%CI为1.026~1.397),女性发生染色体损伤的危险度是男性的1.172倍(95%CI为1.004~1.366),36岁及以上年龄组人群发生染色体损伤的危险度是36岁以下年龄组人群的1.316倍(95%CI为1.130~1.531)。ADPRTVal762Ala和APE1Ile64Val基因多态与氯乙烯致染色体损伤易感性无关。结论氯乙烯职业接触人群中,TDG199Gly/Ser+Ser/Ser基因型携带者发生染色体损伤的风险增高。Objective To investigate the relationship between base excision repair gene polymorphisms and susceptibility of chromosomal damage in Chinese workers exposed to vinyl chloride monomer(VCM).Methods Cytokinesis-block micronucleus(CB-MN)test was used to detect chromosome damage in peripheral lymphocytes for 185 VCM-exposed workers.Genotypes of ADPRT Val762Ala and TDG Gly199Ser were identified by creating restriction site combined with restriction fragment length polymorphism(CRS-RFLP).Genotypes of APE1 Ile64Val were identified by PCR-RFLP technique.Results There was an increased risk of chromosome damage for individuals carrying TDG 199Gly/Ser+Ser/Ser genotypes compared with those carrying Gly/Gly genotype(FR=1.198,95%CI:1.026~1.397).Female workers had an increased risk of chromosome damage compared with male workers(FR=1.172,95%CI:1.004~1.366).The risk of chromosomal damage for VCM-exposed workers equal to or older than 36 years of age was 1.316(95%CI:1.130~1.531)times of those younger than 36 years old.The genetic polymorphism of APE1 Ile64Val and ADPRT Val762Ala were not related to the risk of chromosomal damage.Conclusions VCM-exposed workers carrying TDG 199Gly/Ser +Ser/Ser genotypes tend to be more susceptible to chromosomal damage induced by VCM.
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