光电化学技术在金属腐蚀研究中应用新进展  

New Progress in the Application of Research on Photoelectrochemical Technique for Metal Corrosion

作　　者：徐群杰[1] 齐航[1] 丁斯婧[1] 李春香[1] 周小晶[1] 

机构地区：[1]上海电力学院能源与环境工程学院,上海200090

出　　处：《上海电力学院学报》2008年第1期73-76,共4页Journal of Shanghai University of Electric Power

基　　金：上海市教委重点项目(06ZZ67);上海市科技攻关计划项目(062312045);厦门大学固体表面物理化学国家重点实验室开放课题(200512);上海市重点学科建设资助项目(P1304)

摘　　要：光电化学技术是研究金属腐蚀和缓蚀行为的有效手段,除了将光电化学方法应用于研究金属铜在不同介质中的腐蚀行为及添加不同缓蚀剂后的缓蚀行为之外,综述了近年来采用光电化学技术对铜合金在不同介质中的腐蚀行为、自组装膜对金属的防护效果和将具有光响应的TiO2薄膜涂覆于金属表面进行防腐蚀等方面的研究新进展.Photoelectrochemical technique is a very effective method for studying metal corrosion and inhibition mechanism. The corrosion and inhibiting mechanism on copper in different media with and without inhibitors has been investigated by photocurrent response method, and the new progress in research on corrosion and inhibition for metal and alloy by photoelectrochemical technique are reviewed in detail, including studying corrosion inhibition of copper alloys in different media, studying the self-assembled monolayer on metal surface and studying photoelectrochemical anticorrosion of a Ti02 coating for metal.

关 键 词：光电化学 金属 合金 腐蚀 

分 类 号：TG174.4[金属学及工艺—金属表面处理]