一种利用相位掩模版对光栅波长进行微调的光栅刻写方法  

A Fiber Grating Etching Method With Small Tunable Range of Grating Wavelength Employing Phase Mask

作　　者：王利[1] 常丽萍[1] 陈嘉琳[1] 陈柏[1] 

机构地区：[1]中国科学院上海光学精密机械研究所高功率激光物理国家实验室,上海201800

出　　处：《光子学报》2008年第3期452-455,共4页Acta Photonica Sinica

基　　金：国家863-416项目资助

摘　　要：提出并实验证实了一种刻写光栅时既能保护相位版又能对光栅的反射波长进行微调的方法.通过调整光纤和相位版之间的距离,利用1550nm单模光纤和掺铒分别实现了0.48nm和2.2nm的光栅反射波长的调节.在相位版和光纤之间的距离保持在3mm的条件下,既可以保护相位版又可以获得高质量的光栅.A fiber grating etching method, which can protect phase mask from abrasion and make the grating wavelength tunable in a small range, has been proposed and demonstrated. A tunable range of 0. 48 nm and 2. 2 nm in 1 550 nm single-mode fiber and erbium-doped fiber respectively have been demonstrated through tuning the distance between fiber and phase mask. When the distance between phage mask and fiber is kept as 3 mm, high quality fiber grating can be achieved and phase mask can be shielded from wearing.

关 键 词：光纤光学 光纤光栅 相位版 波长调节 

分 类 号：TN253[电子电信—物理电子学]