Investigation of the cross-reaction mechanism of C_6H_5F-HNO_2 aqueous solution irradiated at 355 nm by transient absorbance spectrum technique  

作　　者：ZHANG RenXi SHEN Yan LI Ping HUANG Li DONG WenBo HOU HuiQi 

机构地区：[1]Institute of Environmental Science, Fudan University, Shanghai 200433, China

出　　处：《Chinese Science Bulletin》2008年第7期998-1003,共6页

基　　金：the National Natural Science Foundation of China (Grant No. 20377009)

摘　　要：The transient absorption spectrum technique was employed to investigate the cross-reaction mecha-nism of C6H5F-HNO2 aqueous solution irradiated at 355 nm. The characteristic and the kinetic parame-ters of transient species were also detected. Hydroxyl radical derived from the photolysis of HNO2 was added to monofluorobenzene with a second-order rate constant of (5.83±0.17)×109 L·mol-1·s-1 to form an adduct, C6H5F···OH, which was able to react with HNO2 as the main reaction pathway with a rate constant of (8.3±0.1)×107 L·mol-1·s-1. The C6F6···OH adduct can also be decayed by elimination of H2O to yield monofluorophenyl radical C6H4F·. By GC-MS technique, the final products were identified to be monofluorophenol, nitro-monofluorobenzene, nitro-monofluorophenol and para-fluorobiphenyl.The transient absorption spectrum technique was employed to investigate the cross-reaction mechanism of C6H5F-HNO2 aqueous solution irradiated at 355 nm. The characteristic and the kinetic parameters of transient species were also detected. Hydroxyl radical derived from the photolysis of HNO2 was added to monofluorobenzene with a second-order rate constant of （5.83±0.17）×10^9 L·mol^-1·s^-1 to form an adduct, C6H5F…OH, which was able to react with HNO2 as the main reaction pathway with a rate constant of （8.3±0.1）×10^7 L·mol^-1·s^-1. The C6F6…OH adduct can also be decayed by elimination of H2O to yield monofluorophenyl radical C6H4F-. By GC-MS technique, the final products were identified to be monofluorophenol, nitro-monofluorobenzene, nitro-monofluorophenol and para-fluorobiphenyl.

关 键 词：溶液作用 瞬变现象 吸收率 光谱学 

分 类 号：O433[机械工程—光学工程]