高斯分布及截断和抽样  

Cut Method and Sample Procedure for Gaussian Beam

作　　者：施将君[1] 李献文[1] 刘军[1] 

机构地区：[1]中国工程物理研究院流体物理研究所

出　　处：《强激光与粒子束》1997年第3期369-371,共3页High Power Laser and Particle Beams

摘　　要：详细推论了高斯分布的轴对称电子束的截断方法和确定截断因子的表达式。结果表明在截断因子为０．９时，电子束发射度等于均方根发射度的二倍，而当电子束发射度等于均方根发射度时，截断因子仅为０．５９。给出了四维坐标变量的几率密度函数公式，并简述了相应的抽样方法。The cut method for Gussian beam having axisymmetry is discussed in detail and the expression for the cut factor is defined in this paper. It is shown that when the factor is equal to 0.9,the cut beam emittance is twice as large as its root mean square (rms) emittance and the factor is only equal to 0.59 if the cut beam emittance is equal to its rms emittance. The probability function for the four dimensional new variables are derived and the sample procedures for them are simply described as well.

关 键 词：四维 高斯分布 截断因子 抽样 电子束传输 

分 类 号：TL501.5[核科学技术—核技术及应用]