采用低温辐射加热源的有机半导体薄膜真空蒸发设备的研制  

Development of low-temperature radiation heater/substrate heater for evaporation of organic semiconductor thin films

作　　者：李训栓[1] 宋长安[1] 彭应全[1] 杨青森[1] 赵明[1] 

机构地区：[1]兰州大学物理科学与技术学院,甘肃兰州730000

出　　处：《真空》2008年第2期43-45,共3页Vacuum

摘　　要：针对有机半导体材料的蒸发温度低的特点,设计并制作了低温辐射式加热器和衬底加热器。低温辐射式加热器能有效的克服传统加热源在制备有机半导体薄膜过程中的缺点。衬底加热器也能明显的改善有机半导体薄膜的表面形貌。采用低温辐射式加热器和衬底加热器对有机半导体材料进行蒸发或溅射镀膜能够取得良好效果。其制作成本低,加热效率高,同时又能提高原有设备功效,在教学和科研生产中有着广泛的应用前景。A low-temperature radiation heater and substrate heater are designed and made aiming at the low evaporating temperature of organic semiconductor materials. The former can efficiently overcome the shortcomings of conventional heaters in the process of preparing organic semiconductor thin films, while the latter can improve the surface morphology of organic semiconductor films. Using both heaters, high-quality organic semiconductor films either evaporated or sputtered can thus be obtained. Due to their low cost and high heating efficiency, they have broad prospect for the applications in both teaching and R＆D.

关 键 词：有机半导体薄膜 低温辐射式加热器 衬底加热器 

分 类 号：TB756[一般工业技术—真空技术]