等离子体浸没离子注入豌豆种子的表面形态研究  

STUDY ON THE SURFACE MORPHOLOGY OF THE GREEN POD EDIBLE PEA SEED IMPLANTED IONS BY A PLASMA IMMERSION ION IMPLANTER

作　　者：吴美萍[1] 何国兴[1] 陈英方[1] 钟华[2] 朱福英[3] 

机构地区：[1]中国纺织大学基础部,上海200051 [2]上海农学院植物科学系,上海201101 [3]中科院上海原子核研究所,上海201800

出　　处：《上海农学院学报》1997年第3期182-185,共4页

基　　金：中国科学院核分析技术开放实验室(LNAT)客座研究课题

摘　　要：用等离子体浸没离子注入设备对食荚青豌种子进行了氩离子注入。卢瑟福背散射方法证实了经这种离子注入后,的确有一定数量的氩离子进入了食荚青豌种子,并发现注入种子的氩离子的相对浓度与注入的时间有关。用扫描电子显微镜对经过注入和未经注入离子的食荚青豌种子的表面形态进行了研究,发现等离子体浸没氩离子注入对种子有刻蚀作用。本文还探讨了这种注入方式引起种子细胞损伤的机制。The seeds of the green pod edible pea were implanted with argon ions using a plasma immersion ion implanter. It was confirmed by Rutherford Back Scattering method that argon ions were implanted into the seed and found that the relative concentrations of the argon ions implanted were related to the implantation time. The ion implanted and untreated seeds were studied with a scanning electron microscope. And it was observed that the surface layer of a seed was carved due to the plasma immersion ion implantation. The possible mechanism of cell damage were discussed in this paper.

关 键 词：等离子体 浸没离子注入 表面形态 豌豆 种子 

分 类 号：S643.304.1[农业科学—蔬菜学]